Hot Plasma Etching of Gallium Nitride

Sara Harrison | 19-FS-005

Executive Summary

We will demonstrate the feasibility of using modern inductively coupled plasma etch technology to fabricate ultra-smooth three-dimensional structures on gallium nitride. The fabrication of three-dimensional gallium nitride structures with high-quality surface morphologies is critical to the development of next-generation high-power electronic components with applications in support of energy security missions.