Film Growth Dynamics During Pulsed Sputter Deposition

Yinmin Wang | 17-ERD-048

Executive Summary

We are studying the physical mechanisms and process parameters controlling the composition, density, thickness, grain structure, and surface morphology of film coatings using the high-power pulsed sputter deposition process. The basic understanding of this process will impact a broad range of industrial applications, including laser targets for future inertial-confinement fusion and high-energy-density campaigns.

Publications and Presentations

Engwall, A. M., et al. 2018. "Beneficial Properties of HiPIMS W Thin Films and the Effect of Standard Processing Parameters." Surface and Coatings Technology . LLNL-JRNL-759980.

Ping, Y., et al. 2018. "Enhanced Energy Coupling for Indirectly Driven Inertial Confinement Fusion." Nature Physics . doi:10.1038/s41567-018-0331-5. LLNL-JRNL-745363.