Defects Suppression in Process-Optimized High Power and Energy Multilayer Dielectric Coated Optics

Siping Qiu | 20-ERD-024

Executive Summary

We are developing thermal- and laser-based processes for improving the resistance to laser-induced damage of multilayer dielectric coatings by understanding the underlying physics and chemistry responsible for the suppression of damage precursors. This research will result in a new class of multilayer dielectric coated optics that will enable advanced laser designs and operations tailored for national security missions.

Publications, Presentations, and Patents

Harthcock, C., et al. 2020. "The Effect of Low Temperature Annealing on the UV, ns-Laser Damage Performance of Hafnia Single Layers." SPIE Laser Damage Digital Forum (online), September 2020. LLNL-PRES-814156

Mirkarimi, P., et al. 2020. "Improvement in UV ns-Laser Performance of Ion Beam Sputtered Dielectric Films Using Xenon Gas." American Coatings Conference (online), 2020. LLNL-JRNL-815116

Peters, V. N., et al. 2020. "Towards Understanding the Difference in Ultraviolet, ns-Laser Damage Resistance Between Hafnia Films Produced by Electron Beam Evaporation and Ion Beam Sputtering Methods." Optics Materials Express 160. LLNL-JRNL-814837