Defects Suppression in Process-Optimized High Power and Energy Multilayer Dielectric Coated Optics
Siping Qiu | 20-ERD-024
We are developing thermal- and laser-based processes for improving the resistance to laser-induced damage of multilayer dielectric coatings by understanding the underlying physics and chemistry responsible for the suppression of damage precursors. This research will result in a new class of multilayer dielectric coated optics that will enable advanced laser designs and operations tailored for national security missions.
Publications, Presentations, and Patents
V. N. Peters, S. R. Qiu, C. Harthcock, R. A. Negres, G. Guss, T. Voisin, E. Feigenbaum, C. J. Stolz, D. Vipin, and M. Huang, “Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods,” J. Appl. Phys.130 043103 (2021): LLNL-JRNL-814837.
S. R. Qiu, “Laser damage precursors for mirrors: identification and suppression.” OMST seminar, LLNL, 2020, July 1.
C. Harthcock, S. R. Qiu, R. A. Negres, G. Guss, T. Voisin, M. Wang, C. Colla, H. Mason, P. Mirkirami, G. Bhowmik, M. Huang, “The effect of low temperature annealing on the UV, ns laser damage performance of hafnia single layers.” SPIE laser damage digital forum, 2020, Sept. 15-18: LLNL-PRES-814156.
V. N. Peters, S. R. Qiu, C. Harthcock, R. A. Negres, T. Voisin, M. Wang, E. Feigenbaum, G. Guss, C. Stolz, G. Bhowmik, M. Huang, 2020, “Towards understanding the difference in UV, ns-laser damage resistance of hafnia films produced by e-beam evaporation and IBS methods.” SPIE laser damage digital forum, 2020, Sept. 15-18: LLNL-PRES-814293.
C. Harthcock, “Ion beam sputtered hafnia film densification via xenon working gas and resultant properties.” OMST seminar, LLNL, 2021, Aug. 25.
C. Harthcock, S. R. Qiu, P. B. Mirkarimi, T. Voisin, C. A. Colla, H. E. Mason, R. A. Negres, G. Guss, D. Vipin, M. Huang, “Impact of film densification on UV-ns laser damage performance for MLD coatings.” SPIE laser damage digital forum, 2021, Oct.12-15: LLNL-PRES-826922 (accepted).