We will demonstrate the feasibility of using modern inductively coupled plasma etch technology to fabricate ultra-smooth three-dimensional structures on gallium nitride. The fabrication of three-dimensional gallium nitride structures with high-quality surface morphologies is critical to the development of next-generation high-power electronic components with applications in support of energy security missions.
Lawrence Livermore National Laboratory • 7000 East Avenue • Livermore, CA 94550
Operated by Lawrence Livermore National Security, LLC, for the Department of Energy's National Nuclear Security Administration.