Pulsed-Plasma Deposition of Ultrathick Diamond-like Carbon Films on Nonplanar Surfaces

Executive Summary

This project aims to develop the capability to deposit ultrathick, robust, uniform coatings of diamond-like carbon with minimal defects and impurities onto non-planar substrates using a pulsed high-density plasma sputtering process. This capability will provide a next-generation ablator for inertial confinement fusion experiments.